Fused Quartz and Silica Rods for Semiconductor Applications

Quartz rod

Fused quartz and silica rods are needed in the semiconductor industry for the manufacturing of batch processing equipment.

Heraeus Conamic offers fused quartz and silica rods in a variety of material grades and dimensions. The critical aspects of the fused quartz and silica rods are low bubble content, high purity and tight geometric tolerances.

In the following you will find an overview of the different fusion technologies that Heraeus Conamic can utilize, each highlighted by the leading material advantage in this segment.

Natural Fused Quartz

Electrically Fused Quartz Rods

HSQ®100 single-step quartz rods are drawn in an electrical fusion process resulting in a cost-efficient solution for many industrial applications.

For more demanding and high-end semiconductor applications Heraeus Conamic can provide multi-step and improved single step electrically fused quartz rods in HSQ®300, HSQ®330 and HSQ®330S material quality depending on the purity requirements of the customers’ application.

This results in a material with enhanced homogeneity and low OH-content for high thermal stability in the final application.

More information about HSQ®

Synthetic Fused Silica

Synthetic Fused Silica Rods

Heraeus Conamic manufactures synthetic fused silica rods for leading edge semiconductor applications. HSQ®900 and Spectrosil are the corresponding material qualities with parts per billion class purity and zero bubble content.

Fused quartz rods are available to meet the tight dimensional and visual requirements in the fabrication of batch furnace components to make boats, wafer carriers and pedestals.

Heraeus Conamic portfolio covers multiple grades to address all OEM requirements including challenging ultra-high purity specifications.