Acrylate Monomers

Heraeus developed and scaled up a number of monomers with sterically hindered groups: From UP grade for new critical layer developments to high-end memory and logic chips-related photo materials such as PR, BARC, and hardmask applications, where cost and volume availability are important factors.

An integral product for the semiconductor industry, monomers are used to make custom polymers for photoresist solutions. Heraeus has along history of creating critical layer polyacrylate-based resists. Together with our customers we have developed and scaled up various monomers with steric-hindering groups.

From the UHP purity grade for new critical layer developments to packaging and thick film-related resist applications, we offer the entire product range. We always keep an eye on the costs and on volume availability. We enjoy an exceptionally close relationship with our customers and are always aware of their growth and scale requirements.

With our custom-made monomers, our customers can even retain the intellectual property rights to their exclusive formulation.

Products

MNLMA

MNLMA

Regular product

CAS Registry Number: 347886-81-1

Properties:

  • White powder
  • m.p. 74~77 °C

Features: Photorelated material for ArF

NMLA

NMLA

CAS Registry Number: 254900-07-7

Properties:

  • White powder
  • m.p. 101~102 °C

Features: Photorelated material for ArF

MAdMA

MAdMA

CAS Registry Number: 177080-67-0

Properties: Colourless liquid

Features: Photorelated material for ArF

ECHA

ECHA

CAS Registry Number: 251909-25-8

Properties: Colourless liquid

Features: Photorelated material for ArF

9-AMM

9-AMM

CAS Registry Number: 31645-35-9

Properties:

  • Yellow powder
  • m.p. 86~88 °C

Features: BARC Deep UV resist