Photo Acid Generators (PAGs)

Continued miniaturization of microchips and ever-evolving computing power of semiconductors increase the demands in the photolithographic process. PAGs from Heraeus Epurio offer unique characteristics for critical layer resists.

Photo Acid Generators (PAGs)

The computing power available to send the first man to the moon in 1969 was less than that available to each of us today on our smartphones. This incredible advance has been made possible by the miniaturization of microchips and the ever-evolving computing power of semiconductors.

The rise in wireless connectivity, sophisticated automotive features or the internet of things are reflected in the rise of demand for semiconductors capable of meeting the highest requirements. Ultra-pure speciality chemicals are the basic raw materials used in the photolithography process which forms the critical layer in the productions of memory and logic chips.

Hereaus Epurio, formerly known as Heraeus Daychem, has been producing electronic grade photoactive materials in Dayton, Ohio, for over 30 years. We have put together selected chromophores with vintage acids to create a unique product offering for critical layer resists in highest resolution.

Most of these products are available in UP quality boasting an above 99.5% purity and a metal content of all 26 metals below 10ppb each. This makes even conventional chemistry available for new frontiers in resist resolution.

At Heraeus, we take your needs very seriously. We always strive to find the best possible solution for your business in close cooperation with you. We offer small and large volumes and help you scale up production whilst safeguarding your intellectual property.