Deep UV PAG (Photo Acid Generators)

Based on 30 years of experience in producing electronic-grade photoactive materials as Daychem Laboratories in Dayton (OH), Heraeus has put together selected chromophores together with vintage acids to create different classes of unique products for critical layer resists in highest resolution.

Most of these products are available in Ultra-Pure (UP) quality with purity above 99.5% and content of all 26 metals below 10 ppb. This makes even conventional chemistry available for new frontiers in resist resolution.

Products

Ionic PAG Strong bulky acid

PA-253

PA-253

Properties:

  • Strong acid generation m.p. 128~9°C
  • High solubility (>20% in PGMEA)

Features:

ArF

Ionic PAG C1 acid

TPS-C1

TPS-C1

Properties:

  • Strong acid(C1) generation
  • m.p. 76~78 °C

Features:

Deep UV

TTBPS-C1

TTBPS-C1

Properties:

  • Strong acid(C1) generation
  • m.p. 164~165 °C

Features:

Deep UV

DTBPIO-C1

DTBPIO-C1

Properties:

  • Strong acid(C1) generation
  • m.p. 104~105 °C

Features:

Deep UV

Ionic PAG – N3 acid

TPS-N3

TPS-N3

Properties:

  • Strong acid(N3) generation
  • m.p. 104~105 °C

Features: Deep UV

TDPS-N3

TDPS-N3

Properties:

  • Strong acid(N3) generation
  • m.p. 83~85 °C

Features: Deep UV

TBPDPS-N3

TBPDPS-N3

Properties:

  • Strong acid(N3) generation
  • m.p. 114~116 °C

Features: Deep UV

TBPTMS-N3

TBPTMS-N3

Properties:

  • Strong acid(N3) generation
  • m.p. 177~178 °C

Features:

Deep UV

TTBPS-N3

TTBPS-N3

Properties:

  • Strong acid(N3) generation
  • m.p. > 240 °C

Features:

Deep UV

Ionic PAG – Nf acid

TPS-Nf

TPS-Nf

Properties: Low diffusion strong acid(nonaflic acid) generation m.p. 84~88°C

Features: Deep UV

TBPDPS-Nf (PA-271)

TBPDPS-Nf (PA-271)

Properties: Low diffusion strong acid(nonaflic acid) generation m.p. 131~137°C

Features: Deep UV

TBPTMS-Nf (PA-282)

TBPTMS-Nf (PA-282)

Properties: Low diffusion strong acid(nonaflic acid) generation m.p. 174~176°C

Features: Deep UV

DTBPIO-Nf (PA-233)

DTBPIO-Nf (PA-233)

Properties:

  • Low diffusion strong acid (nonaflic acid) generation
  • m.p. 175~177 °C

Features: Deep UV

DTBPIO-N1

DTBPIO-N1

Properties:

  • Strong acid(N1) generation
  • m.p.153~155 °C

Features: Deep UV

Ionic PAG – other acids

BTPSPFBDS

BTPSPFBDS

Properties:

  • Strong acid (perfluorobutane disulfonicacid) generation
  • m.p. 157~159 °C

Features: Deep UV

TPS-TFMBS

TPS-TFMBS

Properties:

  • Weak acid (o-trifluoromethylbenzenesulfonic acid) generation
  • m.p. 156~157 °C

Features: Deep UV

DTBPIO-TFMBS

DTBPIO-TFMBS

Properties:

  • Weak acid (o-trifluoromethylbenzenesulfonic acid) generation

Features: Deep UV

DTBPIO-CS

DTBPIO-CS

Properties:

  • Weak acid (camphorsulfonic acid) generation
  • m.p. 215~217 °C

Features: Deep UV

DTBPIOPFBDS

DTBPIOPFBDS

Properties:

  • Strong acid (perfluorobutane disulfonic acid) generation
  • m.p. 175~176 °C

Features: Deep UV

Non-ionic DUV PAG

MDT

MDT

Properties:

  • White powder
  • Strong acid (triflic acid) generation
  • m.p. 88~89 °C

Features: Deep UV

PA-229

PA-229

Properties:

  • White powder
  • Low diffusion strong acid (nonaflic acid) generation
  • m.p. 54~56 °C

Features: Deep UV