Benefit from the broad Heraeus portfolio of fused quartz and fused silica material grades

Fused silica material grades

Making use of all established raw materials and processes in the production of quartz and fused silica, Heraeus enables customers to use specific materials tailored to their particular needs.

Combining advanced knowledge in raw materials and production technology allows Heraeus to provide almost unlimited possibilities in the development of new material grades and qualities with specific properties to match the customers' application.

Material Application Feature
F 300® Used as core or caldding material. The estabilished industry standard for the production of optical fibers. low OH high purity fused silica
F 500® Typically used as subtrate tubes for CVD processes, or when OH is critical. OH-free high purity fused silica
F 320® Typically used for Bend-insensitive-optical fiber production as a trench in the refractive index profile.
May also be used as cladding in fibers with pure silica core.
high purity fused silica with reduced refractive index
F 520 Typically used for Bend-insensitive-optical fiber production as a trench in the refractive index profile. OH free, high purity fused silica with reduced refractive index
Material Grade Production Type Application Feature
HSQ® 100 Electric Industrial Cost effective direct drawn rods, small tubes (OD < 65mm) and plates. Highest viscosity quartz.
HSQ® 300
Electric Semiconductor, solar and industrial High chemical purity, low bubble and inclusion content.
Highest viscosity quartz.
HSQ® 330
Electric High- and super-high purity semiconductor Highest chemical purity, low bubble and inclusion content quartz tube, cylinder, rod, ingot and plate material. Highest viscosity quartz.
HSQ® 400
Electric Industrial, solar, semiconductor High chemical purity, low bubble and inclusion content.
Highest viscosity quartz. Reduced deformation at high temperatures due to chemical stabilisation of the outer surface at process temperatures above 1160°C.
HSQ® 700
Electric Semiconductor, industrial Very high purity, especially low concentration of alkaline metals.
OM® 100
Opaque Semiconductor, industrial, solar, thermally insulating parts, IR radiation blockers Semiconductor compatible purity highly reflective quartz for flanges, spacers, and reflective plates.
TSC-3® / TSC-4
Flame Semiconductor, especially suitable for etch systems Cost effective direct fused quartz with low bubble and inclusion content. Available as ingot, and near net shape heavy-wall hollow cylinders.
HSQ® 351/ HSQ® 751
Flame For semiconductor manufacturing equipment, especially furnace systems Suppressed out-diffusion of metal contaminations.
HSQ® 900 / HSQ® 910 Synthetic Leading edge semiconductor applications Outstanding synthetic chemical purity. Virtually bubble and inclusion free.
Material Grade Application Features
HOQ® 310 Optical elements basic optic grade, higher viscosity
Infrasil® 301 / Infrasil® 302 Near IR applications basic IR grade, higher viscosity, homogeneized in functional direction (302) or all directions (301)
Spectrosil® 2000 UV + VIS applications basic UV grade, improved UV damage resistance
Suprasil® 1 / Suprasil® 2 ArF/KrF Eximer grades best damage resistance to UV light (Excimer lasers)
Suprasil® 1 / Suprasil® 2A UV applications improved UV stabiliy, homogeneized in functional direction (2A) or all directions (1)
Suprasil® 2B UV + VIS applications basic UV grade
Suprasil® 300 IR applications extremely low OH content synthetic grade for IR
Suprasil® 3001 / Suprasil® 3002 all IR applications, e.g. IR laser, laser material processing, low absorption IR applications extremely low OH content, homogeneized in functional direction (3002) or all directions (3001)
Suprasil® 311 / Suprasil® 312 UV Applications basic UV grade, homogeneized in functional direction (312) or all directions (311)
Suprasil® 313 Laser debris shield, fused silica optics with standard specifications cost efficient basic grade
Suprasil® 3301 / Suprasil® 3302 Broadband applications low OH synthetic,homogeneized in functional direction (3302) or all directions (3301)
Suprasil® CG UV + VIS applications commercial UV grade
Suprasil® UVL UV applications damage resistance to UV light
Material Grade Production Type Application Feature Lamp Type
HLQ® 200 Electric infra red processing, UV curing, UV disinfection, projection lamps for SC and LCD stepper clear fused, low OH < 1 ppm available infra red lamps, low and medium pressure UV lamps, sleeves, metal halide lamps
HLQ® 210 Electric laser excitation, beauty and medical
high quality lamps
clear fused, low OH < 1 ppm available, low bubble content, high homogeneity long arc cw and pulsed lamps,
demanding short arc lamps
HLQ® 270 Electric lamps for digital projection,
stage and studio, cinema
clear fused, low OH < 1 ppm available, high homogeneity, low alkaline content, high recrystallisation resistance high and ultra-high pressure short arc lamps, demanding metal halide lamps, demanding cw and pulsed long arc lamps
HLQ® 235 Electric UV disinfection, projection lamps for SC and LCD stepper doped, ozone-free*,
low OH < 1 ppm available
ozon-free low and medium pressure UV lamps, short arc lamps
HLQ® 250 Electric UV tanning doped, ozone-free*,
low OH < 1 ppm available
FDA conform ozone-free lamps
HLQ® 382 Electric excitation lamps e.g. for laser fusion doped, uv-free** long arc lamps
Heralux® plus / vuv Flame UV curing, UV applications,
laser excitation
clear fused, almost free of bubbles, good UV transmission, high resitance to UV radiation medium pressure UV lamps, long arc lamps
M215 / M235 Flame projection lamps for SC and LCD stepper doped, ozone-free*, free of striae ozone-free short arc lamps
M 235 plus Flame projection lamps for SC and LCD stepper, laser exication, medical doped, ozone-free*, high homogeneity, free of striae high intense ozone-free short arc lamps
ozone-free long arc lamps
M 382 plus Flame laser excitation, beauty and medical doped, uv-free**, high homogeneity, free of striae long arc cw and pulsed lamps,
intense pulsed lamps
Suprasil® 030 Synthetic disinfection and purification high purity, high UV transmission medium pressure lamps for deep UV, long life-sleeves for deep UV
Suprasil® 130 Synthetic ozone generation, grease destruction, disinfection and purification, production of ultra pure water high purity, high UV transmission, high resistance to short-wave UV radiation 185 nm low pressure lamps,
medium pressure lamps for deep UV
Suprasil® 300 Synthetic spectroscopy, broad band optical applications highest purity, OH < 1 ppm, free of bubbles, highest transmission from UV to IR spectral range deuterium lamps, high intense mircro-wave lamps
Suprasil® 310 Synthetic surface cleaning in SC and LCD processing, photochemical vapour deposition, surface activation, photochemistry highest purity, free of bubbles, highest UV transmission, resistant to short- wave UV radiation 172 nm Xe-excimer lamps,
very demanding long arc lamps
Spectrosil® 2000 Synthetic highest intense VUV lamps highest purity, free of bubbles, highest UV transmission, resistant to short- wave UV radiation highest intense UV-C short arc lamps
Purasil® Synthetic disinfection and purification high purity, high UV transmission long life-sleeves for deep UV
Purasil® XP Synthetic disinfection and purification high purity, high UV transmission, high
resistance to short-wave UV radiation
longest life-sleeves for deep UV

* (Wavelengths, where ozone forms are absorbed)
** (UV wavelengths are absorbed)

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